Lithography Tools
We have a comprehensive tool set to meet varied lithographic requirements, including a contact mask aligner, a deep ultraviolet stepper coupled with an automated resist processing station and a production-grade 100-kV e-beam lithography system.
Manufacturer: Raith 
The 100kV direct-write electron-beam lithography system can obtain nano-patterning down to sub-10nm. It enables high throughput for wafer scale writing, rapid prototyping, mask-making, and advanced research, shortening the turnaround from proof‑of‑concept to prototypes and low‑volume production.
Manufacturer: ASML
Our 248 nm KrF DUV stepper allows for high-throughput, automated wafer manufacturing. It delivers precise layer alignment and patterning resolutions down to about 180nm. Designed for production, the system supports 25‑wafer batches and integrates fully automated coating, exposure and development steps.
Manufacturer: Amcoss 
Our resist processing station is an automated single-wafer track system designed for substrate chemical processing. It handles reproducible resist coating, solvent developing and critical post-exposure baking and can support 25-wafer batches.
Manufacturer: Suss MicroTec
Our Mask Aligner is a high-precision proximity and contact mask aligner featuring top and backside optical alignment for double-sided substrate processing and enables wafer level backend processing.
Manufacturer: Amcoss
Our Lift off station is a compact, automated wet processing station configured for high-efficiency lift-off and stripping. It utilizes chemical dispensing and high-pressure cleaning to remove photoresists and excess metal.
